Semiconductor Ion Implantation and Plasma Etching Graphite Parts

• Customization: Available
• Carbon Content: 99.9995
• Composition: C
• Model NO.: Customized
• Crystal Morphology: Artificial Graphite
• Forming Way: Isostatic Graphite
• Grade: Customization
• Type: Graphite Parts
• Transport Package: Wooden Case
• Trademark: SIAMC
• Origin: China
• HS Code: 681519
• Production Capacity: Customized

Product Description

SIAMC's graphite products are widely used in ion implantation and plasma etching equipment due to their excellent heat resistance, thermal conductivity, low impurity content, and resistance to corrosion by ion beams.
In ion implantation, high-purity graphite is used in flight tubes, various slits, electrodes, electrode covers, conduits, and beam terminators. These components need to be resistant to the corrosion caused by ion beams.
In plasma etching, the components of the plasma reaction chamber are exposed to the etching gas, which can cause contamination and corrosion. However, graphite is resistant to corrosion under extreme working conditions such as ion bombardment or plasma, making it an ideal material for plasma etching equipment components, such as graphite electrodes.
SIAMC's high-quality graphite products provide excellent performance and reliability for ion implantation and plasma etching equipment, ensuring the quality and efficiency of semiconductor processing.
Our Services:

1. Material Machining Services

2.Material Performance Testing Service

3.Graphite Material Purification Service

4.Graphite Products Coating Service: PyC/TaC/SiC coating

5.Graphite Performance Customization Service



Our Commitment:

We are a large-sized enterprise,more than1000 employees

We are the member of ASTM(American Society for Testing and Materials )

We have the CNAS laboratory(China National Accreditation Service)